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photoresist

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G/I line

Introduction Overview

The photoresist prepared from phenolic resin synthesized by adjusting the ratio of meta cresol to para cresol is mainly used for G-line and I-line applications

Detailed specifications

Grade

Softning   point/°C

Free monomer/%

Molecular weight

Feature

ResiCareâ5200

180-190

<1

8000-12000

m-Cresol

ResiCareâ5201

145-160

<1

2500-4000

m-Cresol

ResiCareâ5300

140-160

<1

5000-7000

（M:P)6:4

ResiCareâ5300

130-140

<1

2500-4000

    (M:P) 4:6



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Record number: E ICP preparation XXXXXXXXX No. -1 © 2025 Shanghai Hengfeng New Material Technology Co., Ltd. All rights reserved
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